Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

Detalhes do produto:

Lugar de origem: China
Marca: OSMANUV
Certificação: ISO9001
Número do modelo: Especificação

Condições de Pagamento e Envio:

Quantidade de ordem mínima: 1 conjunto
Preço: Negociável
Detalhes da embalagem: Embalagem de madeira
Tempo de entrega: 30-45 dias
Termos de pagamento: T/T
Habilidade da fonte: Negociação
Melhor preço Contato

Informação detalhada

Velocidade de revestimento: Alta velocidade Diâmetro de borracha: 100mm
embalagem: Caixa de madeira padrão Largura de trabalho: 600/1000/1300
Rolo de dosagem: 164mm*1450mm Poder: 45 kW
Qty do rolo: 2 peças Caixa elétrica: caixa elétrica independente
Destacar:

fully automatic nanoimprint lithography machine

,

roll-to-plate UV coating machine

,

customizable pressure imprinting line

Descrição de produto

FULLY AUTOMATIC ROLL-TO-PLATE IMPRINTING LINE – HIGH-VOLUME NANOIMPRINT LITHOGRAPHY FOR OPTICS & DISPLAY
Product Overview

This imprinting production line is designed for high-throughput, high-resolution replication of micro/nanostructures using UV nanoimprint lithography (NIL) or thermal imprinting. It supports rigid substrates (silicon, glass, metal) and flexible films (PET, PI, PEN). The system integrates coating, alignment, imprinting, curing, and demolding. Imprinting pressure, temperature, UV dose, and number of stations are fully customizable for various resin systems and pattern sizes.

Technical Specifications
Parameter Standard Value / Range Customization Option
Imprint technology UV-NIL / Thermal NIL Hybrid UV+thermal customizable
Max substrate size 300 mm × 300 mm (square) / 8″ wafer Customizable up to 500 ×500 mm
Imprint pressure 0.5 - 10 bar Customizable up to 50 bar
Temperature range (thermal) RT - 200°C Customizable up to 350 °C
UV intensity 50 - 500 mW/cm² Customizable wavelength & intensity
Alignment accuracy ± 5 μm (std) / ± 0.5 μm (high-precision) Customizable optical alignment
Production throughput 60 - 120 substrates/hour Depends on customizable cycle time
Imprint area uniformity ≥ 95% Customizable multi-zone pressure control
Power supply AC 400V / 50Hz (3-phase) Customizable to 480V / 60Hz
Applications
  • Diffractive optical elements (DOE) & metalenses
  • Augmented reality (AR) / virtual reality (VR) waveguide manufacturing
  • Anti-reflective (AR) & hydrophobic surfaces
  • Biomedical microfluidic devices
  • Flexible electronics & printed sensors
  • Customizable for large-area display optical films
Customization Options

We provide full production line customization including:

  • Number of imprint stations (single‑stage to multi‑step)
  • Substrate transfer method (robot, conveyor, roll-to-roll)
  • Resin dispensing type (spin, slot-die, spray - customizable)
  • Imprint stamp (soft PDMS, hard quartz, Ni shim) - customizable stamp docking
  • Cleanroom integration (ISO 5 to ISO 8 - customizable)
  • Factory automation interface (SECS/GEM, OPC UA - customizable)
Key Features
  • High residual layer uniformity < ± 5%
  • Low imprint force option for fragile stamps
  • Real‑time force & temperature feedback control
  • Automatic stamp cleaning cycle (customizable interval)
  • Recipe‑based operation with barcode or RFID tracking
  • Customizable safety enclosure & light curtains
Support and Services
  • Global remote diagnostics (VPN / secure tunnel)
  • On‑site commissioning & operator training (up to 5 days included)
  • Process transfer support - resin & stamp supplier matching
  • Customizable maintenance contract (quarterly / semi‑annual)
  • 24‑month warranty on imprinting chamber & actuators
Packing and Shipping
  • Anti‑vibration crate with humidity control
  • Vacuum‑sealed desiccant bags for critical optics
  • Shipping: FOB or CIF - customizable pallet labeling & export packaging
  • Lead time: standard 6 weeks, customized lines 10 -14 weeks
Frequently Asked Questions
Q1: Can I imprint 3D multi‑level structures?
A: Yes - multi‑step imprinting with alignment is customizable.
Q2: Does it support roll‑to‑roll?
A: The standard is roll‑to‑plate; full R2R configuration is customizable.
Q3: Can I use my own UV resin?
A: Yes - UV intensity, exposure time and atmosphere (N₂ purge) are programmable and customizable.

Deseja saber mais detalhes sobre este produto
Estou interessado em Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure você poderia me enviar mais detalhes como tipo, tamanho, quantidade, material, etc.
Obrigado!
Esperando sua resposta.